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    Contamination Products

    Calibrate instruments which size and detect particles on the surface of bare silicon wafers.
    The Silica Contamination Standard (SCS) is used to calibrate high-intensity UV and DUV tools.
    The Reticle Contamination Standard (RCS) is used to calibrate instruments which size and detect particles on the surface of a reticle or its protective pellicle.
    The Edge Contamination Standard is designed for particle size standards calibration of instruments that detect and size particles standards on the substrate's wafer edge.
    The Edge Contamination Standard is designed for particle size standards calibration of instruments that detect and size particles standards on the substrate's wafer edge.
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